Adversarial Fashion
- First Epoch
With the development of AI technology, AI surveillance society has arrived. 
Excessive surveillance threatens the privacy of people living in modern times. 
In this project, we adversarially trained an AI model to generate specific patterns inducing AI to misrecognize, 
then created a camouflage garment using the pattern.
 We seek an alternative camouflage for the 21st century and aim to reconsider the relationship 
between the latest technology and our well-beings in the AI surveillance society.

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Developed by 
Technical Direction : Makoto Amano 
Design Lead : Hanako Hirata 
Machine Learning : Ryosuke Nakajima 
Design Support & Film : Yuka Sai

Supervise : Nao Tokui

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Exhibition
date : 2019.11.22 - 11.23
place : TOKYO Midtown

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Research Output Video : "Adversarial Fashion Prototype 01"