Adversarial Fashion
- First Epoch
With the development of AI technology, AI surveillance society has arrived.
Excessive surveillance threatens the privacy of people living in modern times.
In this project, we adversarially trained an AI model to generate specific patterns inducing AI to misrecognize,
then created a camouflage garment using the pattern.
We seek an alternative camouflage for the 21st century and aim to reconsider the relationship
between the latest technology and our well-beings in the AI surveillance society.
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Developed by
Technical Direction : Makoto Amano
Design Lead : Hanako Hirata
Machine Learning : Ryosuke Nakajima
Design Support & Film : Yuka Sai
Supervise : Nao Tokui
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Exhibition
date : 2019.11.22 - 11.23
place : TOKYO Midtown
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